The Cressington sputtercoater can be used to deposit gold nano particles on a carbon substrate (e.g. a TEM grid with carbon support film), and possibly other substrates as well. To do so, simply use a low deposition thickness (around 1 nm for gold on carbon). The thickness should be chosen such that the gold is prevented from forming a film. This should give a high density of small (1-3 nm) nano particles on the substrate. The substrate can then possibly be heated to allow Ostwald ripening to occur, which will give a lower density of larger particles.
Dark field STEM image taken on the Hitachi S-5500 of gold nanoparticles on a TEM grid with ultrathin carbon support. The sample was created by a 1 nm sputtering target. No annealing was performed.
by Vidar T. Fauske (vidar.fauske@ntnu.no)
The Cressington sputtercoater can be used to deposit gold nano particles on a carbon substrate (e.g. a TEM grid with carbon support film), and possibly other substrates as well. To do so, simply use a low deposition thickness (around 1 nm for gold on carbon). The thickness should be chosen such that the gold is prevented from forming a film. This should give a high density of small (1-3 nm) nano particles on the substrate. The substrate can then possibly be heated to allow Ostwald ripening to occur, which will give a lower density of larger particles.
Dark field STEM image taken on the Hitachi S-5500 of gold nanoparticles on a TEM grid with ultrathin carbon support. The sample was created by a 1 nm sputtering target. No annealing was performed.