pyxem / kikuchipy

Toolbox for analysis of electron backscatter diffraction (EBSD) patterns
https://kikuchipy.org
GNU General Public License v3.0
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Stitching issue from master pattern equator with get_patterns() #357

Open hakonanes opened 3 years ago

hakonanes commented 3 years ago

When sampling a hexagonal master pattern of a phase with point group 6mm, I get a stitching line where the "seam" between the two hemispheres is:

mp_stitching_error

The detector normal is parallel to the sample normal (sample_tilt=0), and the crystal orientation is (30, 0, 0) degrees. The seam can be seen between the [1000] and [1100] zone axes.

The master pattern's northern and southern hemispheres in stereographic projection, generated with EMsoft v5.0: mp_stereographic_both_hemispheres_10kv

Don't know the reason for this issue, and don't have the time to look into it at the moment. Reported it here so we can deal with this at a later time.

CiosG commented 3 years ago

I have seen something like this and it was related to fact that hemisphere size in pixels was even number while should be odd. But it was not EMsoft simulation but Dynamics.

Grzegorz

W dniu 2021-05-19 17:34, Håkon Wiik Ånes napisał(a):

When sampling a hexagonal master pattern of a phase with point group 6mm, I get a stitching line where the "seam" between the two hemispheres is:

[1]

The detector normal is parallel to the sample normal (sample_tilt=0), and the crystal orientation is (30, 0, 0) degrees. The seam can be seen between the [1000] and [1100] zone axes.

The master pattern's northern and southern hemispheres in stereographic projection, generated with EMsoft v5.0: [2]

Don't know the reason for this issue, and don't have the time to look into it at the moment. Reported it here so we can deal with this at a later time.

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-- Cios Grzegorz Academic Centre for Materials and Nanotechnology (ACMiN) AGH University of Science and Technology, Krakow, Poland 30 Mickiewicza, 30-059 Krakow bldg. D-16 (Kawiory 30, 30-055 Krakow), room 2.23 tel: +48 12 617 52 78

hakonanes commented 3 years ago

Thanks for letting me know, @CiosG! Just so I understand you correctly, you saw this after sampling with another software than kikuchipy (MasterPattern.get_patterns())? Sampling with Bruker DynamicS?

I think the reason that I haven't seen this before is that I've mostly worked with centrosymmetric materials where we only need the northern hemisphere of the master pattern. So I think all sampling from non-centrosymmetric master patterns where we need both hemispheres have this issue...

The same pattern simulated with EMsoft with the exact same conditions:

mp_stitching_error_emsoft

hakonanes commented 3 years ago

The master patterns above had 1001 x 1001 pixels.

CiosG commented 3 years ago

After simulation with DynamicS we need to save the master pattern (stereographic projection) in odd number dimensions like 513x513 and then we stitch two the same hemispheres. When I once did 512x512 I have seen similar stitches.

I think EMSoft does something similar to keep the number odd.

In the EMEBSDmaster.nml:

! number of pixels along x-direction of the square master pattern
(2*npx+1 = total number) npx = 500,

best regards Grzegorz

W dniu 2021-05-19 18:10, Håkon Wiik Ånes napisał(a):

Thanks for letting me know, @CiosG [1]! Just so I understand you correctly, you saw this after sampling with another software than kikuchipy (MasterPattern.get_patterns()). Sampling with Bruker DynamicS?

I think the reason that I haven't seen this before is that I've mostly worked with centrosymmetric materials where we only need the northern hemisphere of the master pattern. So I think all sampling from non-centrosymmetric master patterns where we need both hemispheres have this issue...

The same pattern simulated with EMsoft with the exact same conditions:

[2]

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[1] https://github.com/CiosG [2] https://user-images.githubusercontent.com/12139781/118846831-652a2780-b8cd-11eb-87f9-cfcf9058ae92.png [3] https://github.com/pyxem/kikuchipy/issues/357#issuecomment-844252039 [4] https://github.com/notifications/unsubscribe-auth/AI3HGBX7OYZI5BLTRAFSD3TTOPPIVANCNFSM45E54DDA

-- Cios Grzegorz Academic Centre for Materials and Nanotechnology (ACMiN) AGH University of Science and Technology, Krakow, Poland 30 Mickiewicza, 30-059 Krakow bldg. D-16 (Kawiory 30, 30-055 Krakow), room 2.23 tel: +48 12 617 52 78