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vincentlv / DimmiLitho

Include pixel-based mask synthesis, imaging model for optical lithography in Python
MIT License
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maskxgrid/maskygrid impact to image simulation #2

Open haoxingren opened 3 years ago

haoxingren commented 3 years ago

hi, I am experimenting with your package. It seems that maskxpitch/maskypitch in source and lens classes have a large impact on the final image. I noticed that by default those values are set as the xrange/yrange of the given mask. However, for the same mask, if I use different maskxptich and maskypitch, the calAI, calRI will create different arial and resist image. I wonder what is the meaning of maskxpitch and maskypitch and what is the correct way to set it if I need to simulate a large number of gds images with different sizes under the same condition?

thanks!

Mark

vincentlv commented 2 years ago

Hi Mark,

Yes, it will. In this simulation, we simply assume a periodic pattern with x period of maskxpitch and y period of maskypitch. Setting different mask pitch basically means the pattern period is changed although the mask pattern is same.

I guess you just want simulate an isolated mask pattern. In that sense, you can set a relatively large mask pitch.

Sorry for the later reply.

Bests, Wen